发明名称 SEMICONDUCTOR DEVICE WITH INTEGRAL HEATSINK
摘要 <p>A semiconductor device comprises a semiconductor substrate (26) having opposite front and rear surfaces; a semiconductor element disposed on the front surface of the semiconductor substrate (26) and including an electrode (21); a PHS (27) for dissipating heat generated in the semiconductor element, the PHS comprising a metal layer and disposed on the rear surface of the semiconductor substrate (26); a via-hole (25) comprising a through-hole penetrating through the semiconductor substrate (26) from the front surface to the rear surface and having an inner surface, and a metal (24a, 27a, or 51) disposed in the through-hole and contacting the PHS (27); and an air-bridge wiring (24) comprising a metal film and having first and second portions, the air-bridge wiring (24) contacting the electrode (21) of the semiconductor element at the first portion and contacting the metal (24a, 27a, or 51) of the via-hole (25) at the second portion. Therefore, heat produced in the semiconductor element is transferred to the PHS not only through the semiconductor substrate just under the element but also through the air-bridge wiring and the via-hole, whereby the heat dissipating property of the device is significantly improved. <MATH> <MATH> <MATH></p>
申请公布号 KR0180285(B1) 申请公布日期 1999.03.20
申请号 KR19950021414 申请日期 1995.07.20
申请人 MITSUBISHI DENKI KABUSHIKI KAISHA 发明人 SHIMURA, TERUYUKI;SAKAI, MASAYUKI;HATTORI, RYO;MATSUOKA, HIROSHI;KATO, MANABU
分类号 H01L23/52;H01L21/3205;H01L21/768;H01L21/8222;H01L23/367;H01L23/48;H01L23/522;H01L23/538;H01L27/082;(IPC1-7):H01L29/737 主分类号 H01L23/52
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