发明名称 Photosensitive composition
摘要 <p>A photosensitive composition capable of producing a photosensitive lithographic printing plate having excellent developing property and press life in direct lithoprinting even if stored in an atmosphere having high temperature and humidity. The photosensitive composition comprising a diazo resin (a) wherein a counter anion is an inorganic acid anion or an aliphatic organic acid anion having 3 or less carbon atoms; a diazo resin (b) wherein a counter anion is an aliphatic or aromatic organic acid anion having 6 or more carbon atoms; and a polyurethane resin which is a reaction product of an isocyanate comprising 40 to 90 mol% of a diisocyanate represented by the general formula (I) defined hereinabove based on the amount of total isocyanate components with an alcohol comprising 30 to 90 mol% of a diol represented by the general formula (II) defined hereinaove based on the amount of total alcohol components.</p>
申请公布号 EP0902325(A2) 申请公布日期 1999.03.17
申请号 EP19980116358 申请日期 1998.08.28
申请人 FUJI PHOTO FILM CO., LTD. 发明人 AONO, KOICHIRO
分类号 G03F7/021;(IPC1-7):G03F7/021 主分类号 G03F7/021
代理机构 代理人
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