| 摘要 |
<p>PROBLEM TO BE SOLVED: To prevent the phenomenon that the reflection surface of a polarization separated reflecting prism is uneven and to enhance productivity. SOLUTION: A pattern on a reticle of an exposure system is transferred onto a wafer. The exposure system comprises a beam source part 62 for generating light, a light-transmitting part and a projection optical part 80. The light oscillates in directions perpendicular to each other, can include two polarized lights of which amplitudes are similar or the same at any time or include one polarized light. The two polarized lights can be generated by the beam source part 62 or the projection optical part 80. One of the two polarized light is reflected by a polarization separated reflect prism, and the other passes through the polarization separated reflecting prism. A required one light of the two polarized lights is selected for propagating to reach the wafer.</p> |
