| 摘要 |
PROBLEM TO BE SOLVED: To provide a pattern inspection method and the device that can simultaneously perform a inspection of a pattern superimposed upon a wiring substrate, a print material or the like in a multiplexed way. SOLUTION: A pattern inspection device consists of a line sensor 10, a picture detection part 11, a detected picture storage part 12, a decision part 13, a normal/defective condition decision output part 14, a reference data storage part 15, a reference data automatic generation part 16, an illumination part 17, an illumination/image pickup control part 18, an NC driving part 19 and an NC table 20. The picture detection part 11 AD-converts an image pickup signal of a substrate 21 which is like a reference substrate or an inspection substrate and detects a reference pattern picture or an inspection pattern picture. The reference data automatic generation part 16 automatically generates reference data from the reference pattern picture in accordance with a reference data generation condition parameter. The decision part 13 compares inspection picture data stored in the detected picture storage part 12 with the reference data stored in the reference data storage part 15, detects a defect of the pattern and performs normal/defective condition decision. |
