发明名称 POLISHING OF CERAMIC MATERIAL
摘要 PROBLEM TO BE SOLVED: To provide a method for polishing a ceramic material by allowing a polishing liquid containing abrasive particles consisting mainly of ferric oxide to intervene between a polisher and a work piece formed from a silicon nitride- based ceramic and simultaneously relatively moving both the work piece and the polisher, enabling to easily finish the work piece into an objective shape and an objective surface roughness in a short time. SOLUTION: This method for polishing a ceramic material comprises facing the surface of a work piece 3 formed from a silicon nitride-based ceramic and held with a holder 4 to the processing surface of a rigid resin polisher 2 adhered to the upper surface of a rotary table 1, spraying a polishing liquid containing abrasive particles having an average particle diameter of 0.1-1.0μm and containing ferric oxide as a main component from a nozzle 7 for the abrasive liquid, (A) pressing the work piece 3 to the processing surface of the polisher 2 with an ornamental hair pin 5, (B) rotating the polisher 2, and simultaneously (C) laterally swinging the ornamental hair pin 5 and the work piece 3. The holder 4 is rotatably supported with the ornamental hair pin 5, and the work piece 3 freely rotated on the ornamental hair pin 5 in response to the rotation of the polisher 2.
申请公布号 JPH1171191(A) 申请公布日期 1999.03.16
申请号 JP19970231114 申请日期 1997.08.27
申请人 NIKON CORP 发明人 TSUSHIMA MITSUO
分类号 C04B41/91;C04B41/53;(IPC1-7):C04B41/91 主分类号 C04B41/91
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