| 摘要 |
<p>PROBLEM TO BE SOLVED: To expose and form an isolated pattern regularly arranged into a matrix shape and an isolated pattern arranged in a shifted position from these positions at the same time by having plural light-transmitting regions which form respectively the phase differences of specific values to exposure light. SOLUTION: The shading part 14 of a phase shift mask is formed of a lightproof film on a light-transmitting mask substrate. The light-transmitting part formed as openings in the shading film is provided with plural first light- transmitting regions 11, 12 which are periodically and two-dimensionally arranged along the X-axis and Y-axis directions. Moreover, a second light- transmitting region 13 is provided in the area surrounded by the four first light-transmitting regions 11, 12 adjacent to each other. A 90 deg. phase difference is formed between the first light-transmitting region 11 and the second light- transmitting region 13. A 90 deg. phase difference is formed between the first light- transmitting region 12 and second light transmitting region 13 as well. A 180 deg. phase difference is formed between the first light-transmitting region 11 and the light-transmitting region 12.</p> |
