发明名称 Semiconductor memory device and method for making the same
摘要 A semiconductor memory device comprises a capacitor and a transistor formed on a main surface of a semiconductor substrate and a buried layer of high impurity concentration formed in the substrate, wherein the buried layer has the same conductivity type as that of the substrate and is formed shallow under the capacitor and deep under the transistor.
申请公布号 US5883408(A) 申请公布日期 1999.03.16
申请号 US19940296988 申请日期 1994.08.26
申请人 MITSUBISHI DENKI KABUSHIKI KAISHA 发明人 TSUKAMOTO, KATSUHIRO
分类号 H01L29/78;H01L21/8242;H01L27/10;H01L27/108;(IPC1-7):H01L27/108;H01L29/76;H01L29/94;H01L31/119 主分类号 H01L29/78
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