| 摘要 |
PROBLEM TO BE SOLVED: To provide a negative photosensitive resin compsn. with which a fine polymer film pattern having excellent adhesion property with a substrate or the like can be produced in safe and easy processes. SOLUTION: This resin compsn. contains a thermosetting polymer precursor which is dehydrated, cyclized and hardened by heating, and a photosensitive thermosetting accelerator. The photosensitive thermosetting accelerator consists of a compd. with substitution of protective substituents which leave by irradiation of light, or a N-oxide compd. in which oxide groups are transferred by irradiation of light to generate the thermosetting acceleration performance. Or, the photosensitive thermosetting accelerator consists of a compd. which produces an acid by irradiation of light to generate the thermosetting acceleration performance. Moreover, the photosensitive thermosetting accelerator may consist of a latent thermosetting accelerator which can be changed into a compd. showing the thermosetting acceleration performance by the reaction with an acid and of a photoacid producing agent which produces an acid by irradiation of light. |
