| 摘要 |
An aligner body comprising subunits ranging from an illumination optical system (2) to a wafer stage (8) is accommodated inside a thermostatic chamber (100) of a chamber (1). A gas (A2) whose temperature has been raised by the heat generated from the aligner body is sent into a fluid feeder (11) disposed below the floor of the chamber (1) from the chamber (100) via an exhaust duct (17) and, after its temperature is adjusted to a predetermined temperature, it is supplied to a supply duct (16). The gas (A4) so supplied is then guided into a temperature adjusting chamber (23) disposed on the ceiling portion of the chamber (1) and its temperature is accurately adjusted to a desired target temperature by a Peltier device (18) disposed inside this chamber (23). The gas (A5) with a constant temperature is sent into the thermostatic chamber (100) through a dust collecting filter (21) inside a filter chamber (22b). In this way, the vibration generated by the temperature adjustment is not transmitted into the chamber (1) in which the aligner body is accommodated, and the temperature inside this chamber (1) is adjusted highly accurately to a constant level.
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