| 摘要 |
<p>A photomask case (210) contains a reticle on which a pattern to be transferred onto a wafer is formed. Positioning recesses (211, 212, 213) into which support pins are inserted are formed on the bottom (210C) of the mask case (210). The shape of a first recess (211) is a triangular pyramid, or a cone and the shape of a second recess (212) is a V-groove.</p> |
