A method for making silicon oxynitride comprising providing a vaporous gas stream of a compound selected from the group consisting of silazanes and siloxazanes. An enclosed, heated reaction site is also provided. The vaporous gas stream is delivered to the enclosed, heated reaction site in which the levels of oxygen are strictly controlled to promote the formation of silicon oxynitride particles.
申请公布号
WO9911573(A1)
申请公布日期
1999.03.11
申请号
WO1998US16358
申请日期
1998.08.05
申请人
CORNING INCORPORATED;DAWSON-ELLI, DAVID, F.;TRUESDALE, CARLTON, M.