发明名称 METHOD FOR FABRICATING SILICON OXYNITRIDE
摘要 A method for making silicon oxynitride comprising providing a vaporous gas stream of a compound selected from the group consisting of silazanes and siloxazanes. An enclosed, heated reaction site is also provided. The vaporous gas stream is delivered to the enclosed, heated reaction site in which the levels of oxygen are strictly controlled to promote the formation of silicon oxynitride particles.
申请公布号 WO9911573(A1) 申请公布日期 1999.03.11
申请号 WO1998US16358 申请日期 1998.08.05
申请人 CORNING INCORPORATED;DAWSON-ELLI, DAVID, F.;TRUESDALE, CARLTON, M. 发明人 DAWSON-ELLI, DAVID, F.;TRUESDALE, CARLTON, M.
分类号 C01B21/082;C23C16/30;(IPC1-7):C01B15/14;B05D3/02;C04B33/32;C04B35/597 主分类号 C01B21/082
代理机构 代理人
主权项
地址