PREPARATION OF DATA FOR CHARGED PARTICLE BEAM LITHOGRAPHY AND RECORDING MEDIUM WITH PROGRAM RECORDED FOR PATTERN DATA PREPARATION FOR LITHOGRAPHY

摘要

PROBLEM TO BE SOLVED: To speedily correct calculation error generated during a conversion from CAD data to pattern data when the diference between a CAD data and a pattern data for writing device is verified by a verifying means and is compensated by compensation of the lithographic pattern data with correlation calculation. SOLUTION: A EB data 19a (EB data zero) is generated when a pattern fault is generated with a conversion from the CAD data to the pattern data for lithography and the CAD data 18 is converted into the lithographic data by applying the method of making the data for charged particle beam lithography. An exclusive OR operation of the CAD data 18 and the EB data 19a makes it possible to educe the pattern data 20a as an eor data showing the pattern fault. At the next flow, both the EB data 19a and the eor data 20a are output as the data for lithogaphy The data for lithography 25a having no differnce from the CAD data 18 can be obtained and the pattern drop fault can be compensated.