| 摘要 |
PROBLEM TO BE SOLVED: To prevent pattern registration errors and to improve overlay accuracy by forming a gate oxide layer, a conductive layer and a resist layer in sequence by lamination on a substrate and by forming an electrical charge dissipating layer including a specified conductive polymer on the resist layer. SOLUTION: A gate oxide layer is formed on a silicon substrate 10. A conductive layer such as polysilicon is formed on the gate oxide layer and is subjected to patterning for demarcating suitable gate electrodes for use in device manufacture. An electron-beam resist layer 12 is deposited on the conductive layer and an electrical charge dissipating layer 14 including a conductive polymer represented by a formula is deposited on the resist layer 12. In this case, R is acid in the formula. In this way, arising of pattern registration errors can be prevented and the overlay accuracy can be improved. |
