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发明名称
FORMATION TREATMENT OF OXIDE FILM ON SURFACE OF SEMICONDUCTOR SUBSTRATE
摘要
申请公布号
JPH1167756(A)
申请公布日期
1999.03.09
申请号
JP19970228185
申请日期
1997.08.25
申请人
SHARP CORP
发明人
KOMATSU YUJI
分类号
H01L21/316;(IPC1-7):H01L21/316
主分类号
H01L21/316
代理机构
代理人
主权项
地址
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