发明名称 SUBSTRATE TREATMENT APPARATUS
摘要 PROBLEM TO BE SOLVED: To obtain an inexpensive substrate treatment apparatus, in which the heat treatment time is maintained constant to heating properly by contriving the conveyance route of a substrate. SOLUTION: An apparatus is provided with an exclusive conveyance mechanism 13, in which heating units 7 and cooling units 9 are arranged in such a way that their respective conveyance ports 7a, 9a are faced with a conveyance passage 11, and in which a substrate is conveyed only between the heating units 7 and the cooling units 9. It is provided with a conveyance mechanism 1, in which a substrate is conveyed between the heating units 7 and the cooling units 9 and an exposure unit 21 which executes an exposure treatment. At this time, on the basis of the relationship between the total treatment time and the total heating treatment time, the conveyance mechanism 1 conveys the substrate between the cooling units 9 via the heating units, or it conveys the substrate directly between the heating units 7, or it conveys the substrate between the heating units 7 via the cooling units 9. Thereby, the treatment time in the heating units 7 is made constant.
申请公布号 JPH1167864(A) 申请公布日期 1999.03.09
申请号 JP19970226546 申请日期 1997.08.22
申请人 DAINIPPON SCREEN MFG CO LTD 发明人 SUGIMOTO KENJI
分类号 H01L21/677;H01L21/68;(IPC1-7):H01L21/68 主分类号 H01L21/677
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