发明名称 PHOTOPOLYMERIZING COMPOSITION
摘要 FIELD: polymers production. SUBSTANCE: oligocarbonate-dimethacrylate-based composition for manufacturing photopolymer products by anaerobic stereolithography technique contains triethylene glycol dimethacrylate, organocopper compound with general formula 1: <EMI ID=0.589 HE=36 WI=54 TI=CHI> (1), where n= 2 and R is -(CH<SB>2</SB>-CH<SB>2</SB>-O)<SB>3</SB>-, unsaturated monomer - butyl methacrylate, and photoinitiator - 2,2-dimethoxy-2-phenylacetophenone. EFFECT: accelerated hardening of composition and reduced its volume shrinkage upon hardening. 2 dwg, 1 tbl, 3 ex
申请公布号 RU2127444(C1) 申请公布日期 1999.03.10
申请号 RU19970104261 申请日期 1997.03.18
申请人 BYSTROV SERGEJ GENNAD'EVICH;KODOLOV VLADIMIR IVANOVICH;CHIRKOVA ELENA IVANOVNA;BONDAR' JURIJ VASIL'EVICH;BONDAR' ANDREJ JUR'EVICH 发明人 BYSTROV S.G.;KODOLOV V.I.;CHIRKOVA E.I.;BONDAR' JU.V.;BONDAR' A.JU.
分类号 G03F7/031;G03F7/033;(IPC1-7):G03F7/031 主分类号 G03F7/031
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