| 摘要 |
<p>PROBLEM TO BE SOLVED: To obtain a storage box by which the surface of a semiconductor substrate is maintained clean, in a semiconductor manufacturing process and a material treatment process. SOLUTION: A lid body 2 which formed a set together with a container body 1 in a storage box is formed as an integrated structure, which is provided with a filter for organic gas removal and a filter 3 for particle removal. The filter 3 for organic-gas removal 3 is used to capture and remove an organic gas generated inside the container body 1. The filter 3 for particle removal is used to capture and remove particles which creep into the container body 1. In addition, the container body 1 is constituted of a metal-free synthetic resin, which does not discharge an organic substance.</p> |
