发明名称 |
Photomask having a half-tone type phase shift material and chrome pattern on a transparent substrate |
摘要 |
A half-tone phase shift mask capable of preventing light from being transmitted in undesired areas, and thus capable of obtaining desired fine patterns. The present invention is to provide a photomask for simultaneously forming photoresist patterns on a first area in which fine patterns are to be formed and on a second area in which relatively large photoresist patterns are to be formed in a semiconductor device. The photomask comprises a transparent substrate, half-tone phase shift patterns disposed on the first area of the transparent substrate and light screen patterns disposed on the second area of the transparent substrate. |
申请公布号 |
US5879839(A) |
申请公布日期 |
1999.03.09 |
申请号 |
US19970879807 |
申请日期 |
1997.06.20 |
申请人 |
HYUNDAI ELECTRONICS INDUSTRIES CO., LTD. |
发明人 |
JUNG, WOO YUNG;LEE, TAE GOOK |
分类号 |
G03F1/08;G03F1/00;G03F1/32;G03F1/68;H01L21/027;(IPC1-7):G03F9/00 |
主分类号 |
G03F1/08 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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