| 摘要 |
PROBLEM TO BE SOLVED: To simplify the structure of a developing device which develops a photoresist on a semiconductor wafer, on which a circuit pattern of element is printed in the lithography process. SOLUTION: For example, a developer which supplies a nozzle 21 is provided almost in a rectangular shape having a length almost equal to the diameter of a semiconductor wafer HW, and its inside is divided to a developer stoage chamber for temporarily storing the developer and a cleaning liquid storing chamber for temporarily storing pure water as a cleaning liquid. The developer- strage chamber is connected with a developersupplying pipe 21c, while the cleaning liquid storing chamber is connected with a cleaning liquid supplying pipe 21c, respectively. Thereby, the developer and cleaning liquid can be discharged from the same nozzle so that only one nozzle drive means 22 is required. |
