发明名称 |
ANTIREFLECTION FILM AND DISPLAY DEVICE ARRANGED THEREWITH |
摘要 |
PROBLEM TO BE SOLVED: To provide a process having adaptability to mass production of large sized antireflection films which exhibit uniformly low reflectivity (reflectivity <=1%) in a wide wavelength region and are simultaneously excellent in film strength and heat resistance. SOLUTION: This antireflection film has at least one layer of a low-refractive index layer which has microvoids of <=200 nm in average diameter and consists of a fluorine-contained polymer. The fluorine-contained polymer is produced by the polymn. reaction of a monomer contg. at least one kind of the corresponding fluorine-contained monomer in a stage for production and is formed with the microvoids formed by the deposition and flocculation of the polymer formed in the polymn. process. |
申请公布号 |
JPH1164601(A) |
申请公布日期 |
1999.03.05 |
申请号 |
JP19970216833 |
申请日期 |
1997.08.11 |
申请人 |
FUJI PHOTO FILM CO LTD |
发明人 |
YASUDA TOMOKAZU |
分类号 |
G02B1/11;B05D7/24;B32B7/02;B32B27/30;C03C17/38 |
主分类号 |
G02B1/11 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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