发明名称 PHOTOSENSITIVE RESIN COMPOSITION AND PHOTOSENSITIVE RESIN PLATE
摘要 PROBLEM TO BE SOLVED: To provide a water-developable photosensitive resin compsn. having high photopolymn. reactivity and hardly causing defective development due to storage by incorporating a specified phosphorus compd. and specified two compds. as stabilizers by a specified amt. each. SOLUTION: A phosphorus compd., bis (3,5-di-tert.-butyl-4-hydroxybenzyl) sulfide and 2-tert.-butyl-6-(3-tert.-butyl-2-hydroxy-5-methylbenzyl)-4-methylphenyl acrylate are incorporated as stabilizers by 0.01-3 pts.wt. each into 100 pts.wt. water-developable photosensitive resin compsn. The phosphorus compd. is, e.g. monoisodecyl phosphate, monomethyl phosphate, dimethyl phosphate, mono-(2-(meth)acryloyloxyethyl) phosphate or bis(2-(meth)acryloyloxyethyl) phosphate.
申请公布号 JPH1165104(A) 申请公布日期 1999.03.05
申请号 JP19970226085 申请日期 1997.08.22
申请人 ASAHI CHEM IND CO LTD 发明人 OYOSHI TAKESHI;ARAKI YOSHIFUMI
分类号 G03F7/004;G03F7/00;(IPC1-7):G03F7/004 主分类号 G03F7/004
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