发明名称 PLASMA CVD DEVICE
摘要 PROBLEM TO BE SOLVED: To heat radicals in plasma to moreover activate the plasma. SOLUTION: This device has a reaction vessel 21, an electrode 22 for discharge arranged in the reaction vessel 21, a heater 24 for substrate heating arranged parallel to the electrode 22 for discharge and to be mounted with a substrate 23 and infrared heaters 25 and 26 arranged in the reaction vessel 21 and irradiating glow discharge plasma generated on the space between the electrode 22 for discharge and the heater for substrate heating with infrared rays.
申请公布号 JPH1161418(A) 申请公布日期 1999.03.05
申请号 JP19970231065 申请日期 1997.08.27
申请人 MITSUBISHI HEAVY IND LTD 发明人 NISHIDA SEIICHI;MORITA SHOJI;MURATA MASAYOSHI
分类号 C23C16/46;C23C16/50;H01L21/205;H01L21/31;H01L31/04 主分类号 C23C16/46
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