| 摘要 |
PROBLEM TO BE SOLVED: To provide a photosensitive compsn. showing excellent storage stability without decrease in excellent photosensitive characteristics and having high resolution and good process stability, and to provide a producing method of a relief pattern showing excellent heat resistance, adhesion property and chemical resistance. SOLUTION: This photosensitive compsn. contains (A) a compd. selected from benzoquinone compds., phenol compds., etc., (B) a dye compd. showing absorption in 450 to 600 nm region, (C) a titanocene compd. expressed by the formula (wherein R<1> to R<10> are each hydrogen atom, alkoxy group, etc.), (D) a N-aryl-α-amino acid having cyano groups, etc., and (E) a compd. having addition polymerizable groups or a polymer having addition polymerizable groups. The relief pattern is produced by irradiating a coating film of this photosensitive compsn. with active rays through a mask having a pattern and developing to remove the part not to be irradiated.
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