摘要 |
The invention concerns a method for producing compounds containing fluorine characterised in that it consists in reacting a compound containing one or several halogen atoms capable of being replaced by fluorine with a fluoride corresponding to general formula (I) KAT<+>F-, in which KAT<+> represents an alkaline metal ion, NH4<+>, an alkaline-earth metal ion or a residue corresponding to general formula (II) A<1>A<2>A<3>A<4>N<+>, in which A<1>, A<2>, A<3>, A<4> correspond to the definition given in the description, in the presence of a compound or a mixture of compounds corresponding to general formula (III), in which A<5>, A<6>, A<7>, A<8>, A<9>, A<10>, A<11>, A<12> correspond to the definition given in the description and B represents a monovalent acid residue or the equivalent of a polyvalent acid residue, and in the presence of one or several compounds corresponding to general formula IVa: X-NO2 and/or IVb: X-SO-X', where X and X', independently of each other identical or different correspond to the definition given in the description, in the presence or not of a solvent, at temperatures ranging between 40 DEG C and 260 DEG C.
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申请人 |
HOECHST AG, 65929 FRANKFURT, DE |
发明人 |
APPEL, WOLFGANG, DR., 65779 KELKHEIM, DE;PASENOK, SERGEJ, DR., 65779 KELKHEIM, DE;WESSEL, THOMAS, DR., 60386 FRANKFURT, DE |