| 摘要 |
<p>An active matrix display in which a thick insulating film is preferably formed to surround an organic semiconductor film of a thin-film light-emitting element without damaging the thin-film light-emitting element, and which is provided with thick bank layers (bank) formed along the data line (sig) and the scanning line (gate) to suppress the capacitance parasitic on the data line (sig) and surround a region where the organic semiconductor film (43) of the thin-film light-emitting element (40) is formed by the ink-jet method. Here, the bank layer (bank) is constituted of a lower insulating film (61) formed of a thick inorganic material and an upper insulating film (62) formed of an organic material and laminated with a narrow width on the lower insulating film (61), so as to avoid the contact between the organic semiconductor film (41) and the upper insulating film (62).</p> |
