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发明名称
Herstellverfahren für ein selbstjustiertes Kontaktloch und Halbleiterstruktur
摘要
申请公布号
DE59309324(D1)
申请公布日期
1999.03.04
申请号
DE19935009324
申请日期
1993.09.22
申请人
SIEMENS AG, 80333 MUENCHEN, DE
发明人
MELZNER, HANNO, DIPL.-PHYS., D-85655 GROSSHELFENDORF, DE
分类号
H01L21/768;H01L23/48;(IPC1-7):H01L21/768
主分类号
H01L21/768
代理机构
代理人
主权项
地址
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