发明名称 PRODUCTION OF LITHIUM NIOBATE THIN FILM
摘要 PROBLEM TO BE SOLVED: To prepare a uniform thin film at low temp. by preparing a precursor by deesterification reaction of an org. acid lithium with an alkoxyniobium, depositing the precursor on a base body and heating. SOLUTION: The precursor of lithium niobate prepared by deesterification reaction of the org. acid lithium and the alkoxyniobium is deposited on the base body and heated to produce a lithium niobate thin film. Since the reaction is stable and fast carried out at low temp., uniform optical characteristics such as refractive index and SHG phase matching const. can easily be obtd. As for the org. acid lithium, a satd. or unsatd. carboxylic acid lithium and an aromatic carboxylic acid lithium are preferably used. The alkoxyniobium is preferably pentamethoxyniobium. The deesterification reaction is carried out under the conditions of at 15 to 40 deg.C for 0.1 to 100 hours. As for the base body, a substrate such as silicon and sapphire is used. The thin film is preferably formed by heating in two stages of at 50 to 250 deg.C and at 300 to 500 deg.C, and further, preferably crystallized at 500 to 1000 deg.C.
申请公布号 JPH1160385(A) 申请公布日期 1999.03.02
申请号 JP19970210969 申请日期 1997.08.05
申请人 OKI ELECTRIC IND CO LTD 发明人 OKABE YUTAKA;KOIWA ICHIRO
分类号 G02B6/13;C01G33/00;C30B7/06;C30B29/30 主分类号 G02B6/13
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