发明名称 Apparatus and method for analysis of surface impurities in a very small region
摘要 PCT No. PCT/JP96/03406 Sec. 371 Date Jul. 21, 1997 Sec. 102(e) Date Jul. 21, 1997 PCT Filed Nov. 21, 1996 PCT Pub. No. WO97/19343 PCT Pub. Date May 29, 1997An analysis method by which a surface impurity in a very small region can be specified, wherein an electron beam is accelerated with an acceleration voltage and irradiated upon a very small region of a specimen and a mass spectrometry of neutral surface impurity molecules desorbed from the very small region is performed. The acceleration voltage for accelerating the electron beam is set to a voltage with which desorption of the neutral surface impurity molecules by an electron stimulated desorption (ESD) effect occurs.
申请公布号 US5877496(A) 申请公布日期 1999.03.02
申请号 US19970860926 申请日期 1997.07.21
申请人 ADVANTEST CORPORATION 发明人 TABUSE, KAZUHIKO;WATANABE, MASAO
分类号 G01N23/225;H01J37/252;(IPC1-7):H01J49/00 主分类号 G01N23/225
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