发明名称 |
Chemically amplified positive resist composition |
摘要 |
A chemically amplified positive resist composition contains (A) an organic solvent, (B) a base resin in the form of a polyhydroxystyrene having phenolic hydroxyl groups some of which are protected with alkoxyalkyl groups and having a weight-average molecular weight of 3,000-300,000 and a dispersity of 1.0 to 1.5, (C) a photoacid generator, and (D) a vinyl ether group-containing compound. The composition is sensitive to actinic radiation, especially KrF excimer laser beam, has high sensitivity and resolution, and forms a resist pattern having improved plasma etching resistance and heat resistance.
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申请公布号 |
US5876900(A) |
申请公布日期 |
1999.03.02 |
申请号 |
US19970831300 |
申请日期 |
1997.04.01 |
申请人 |
SHIN-ETSU CHEMICAL CO., LTD. |
发明人 |
WATANABE, SATOSHI;ISHIHARA, TOSHINOBU;NAGURA, SHIGEHIRO;YAMAOKA, TSUGUO |
分类号 |
G03F7/004;G03F7/039;H01L21/027;(IPC1-7):G03F7/029;G03F7/033 |
主分类号 |
G03F7/004 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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