| 摘要 |
A cleaning mechanism for removing residual marking particles and other debris from a dielectric member of a reproduction apparatus and polish the dielectric member and remove fine scratches therefrom. The cleaning mechanism includes a substantially cylindrical fiber brush rotatable about its longitudinal axis with the fibers of the brush in contact with the dielectric member. A housing encloses that portion of the fiber brush not in contact with the dielectric member. The housing defines a substantially cylindrical chamber with the inner wall thereof spaced from the outer extremes of the brush fibers. In this manner, residual marking particles and debris are allowed to collect between the fibers of the brush to an extent sufficient to enable the fiber brush, when loaded with such marking particles and debris, to polish the dielectric member and remove fine scratches as the fibers clean the dielectric member.
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