| 摘要 |
PROBLEM TO BE SOLVED: To provide a photomask which is free from peeling of a light shielding film while transporting and handling and a process for producing the same as well as a baking device for producing this photomask. SOLUTION: This process consists in forming a resist film 14 on a mask blank 16 formed with the light shielding film 12 on a substrate 10, selectively heating the prescribed regions exclusive of the peripheral edges of this mask blank and exposing the heated resist film with prescribed patterns. Further, the resist film at the peripheral edges is selectively dissolved and the exposed resist film is developed to the patterns. The light shielding film is etched with the patterned resist film as a mask to remove the light shielding film at the peripheral edges and the light shielding film is processed to the patterns. |
