发明名称 VERTICAL HEAT TREATMENT DEVICE
摘要 <p>PROBLEM TO BE SOLVED: To make it possible to minimize a crack-up of a boat and wafer, and downtime when an accident occurs. SOLUTION: A boat 20 is inserted into a heat treatment furnace 40 for heat treatment. A mechanical control section 80 counts and stores the quantity of a wafer 1 inserted into the heat treatment furnace 40 based on the output from a transmission sensor 50 and a wafer detecting section 60. After the heat treatment of the wafer 1, the boat 20 is lowered. When it has reached the predetermined starting position of wafer detection, the quantity of the wafer 1 pulled out from the heat treatment furnace 40 is counted. When it has reached the predetermined ending position of wafer detection, the quantity count of the wafer 1 is finished. When there is a difference between the quantity of the wafer detected and the quantity of the wafer 1 stored, a notification of the crack-up of the wafer 1 is alarmed, and transferring operation of the wafer 1 from the boat 20 to a wafer cassette 10 by a wafer transferring device 30 is prohibited.</p>
申请公布号 JPH1154593(A) 申请公布日期 1999.02.26
申请号 JP19970211548 申请日期 1997.08.06
申请人 KOKUSAI ELECTRIC CO LTD 发明人 TODOROKI YUTAKA
分类号 H01L21/677;H01L21/22;H01L21/68;(IPC1-7):H01L21/68 主分类号 H01L21/677
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