发明名称 DEPOSITION SOURCE FOR FORMING SOFT MAGNETIC THIN FILM BY VACUUM DEPOSITION
摘要 PROBLEM TO BE SOLVED: To manufacture a magnetic head suitable for high density recording at a high yield, by suppressing the concentration of a gas contained in a deposition source composed of cobalt-iron-nickel alloy at a specific wt.% or below. SOLUTION: A material prepared by mixing alloy materials, i.e., cobalt, iron and nickel, at specified wt.% is put in a platinum pot. The pot is contained in a vacuum furnace to be heated, and the alloy material is melted and mixed. At that time, the vacuum inside the furnace is kept at 4×10<-6> Torr or lower. Thus, even when a gas of a slight quantity is generated inside the alloy material, the gas does not stay on the surface of the source to form a film as the material is in the vacuum atmosphere, and the gas goes out to the atmosphere. When the degassing is not sufficiently obtained even in vacuum, HIP process (the alloy material is compressed to degas) is performed as the degassing process from molten metal. Thus, the concentration of the gas contained in the manufactured deposition source (cobalt-iron-nickel alloy ingot) is kept at 0.005 wt.% or less.
申请公布号 JPH1154324(A) 申请公布日期 1999.02.26
申请号 JP19970221093 申请日期 1997.07.31
申请人 FUJI ELELCTROCHEM CO LTD 发明人 YAMAZAKI FUMIHIRO;MURAKAMI NORIJI;ONO TAKAHIDE
分类号 C23C14/24;G11B5/31;G11B5/85;H01F10/14;H01F10/16;H01F41/20;(IPC1-7):H01F10/14 主分类号 C23C14/24
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