发明名称 |
METHOD AND EQUIPMENT FOR INSPECTION USING ELECTRON BEAM |
摘要 |
<p>PROBLEM TO BE SOLVED: To provide high speed method and equipment for inspection using electron beam. SOLUTION: An electron beam 36 from an electron gun 1 is focused through an objective lens 9 and decelerated by a retarding voltage being applied to a sample 13 which is scanned with an electron beam while moving. Secondary electrons 33 emitted from the sample 13 are accelerated by the retarding voltage to produce a substantially parallel beam which is then deflected by an E×B deflector 18 interposed between the objective lens 9 and the sample 13. A secondary electron generating body 19 is irradiated with the deflected beam to emit secondary electrons 20 which are detected by a charged particle detector 21. The detection signal is stored in the form of an image signal and process at an operating section 29 before a decision is made whether a defect is present at a decision section 30 through comparison.</p> |
申请公布号 |
JPH1151886(A) |
申请公布日期 |
1999.02.26 |
申请号 |
JP19970212908 |
申请日期 |
1997.08.07 |
申请人 |
HITACHI LTD |
发明人 |
IWABUCHI HIROKO;TODOKORO HIDEO;MORI HIROYOSHI;SATO MITSUGI;USAMI YASUTSUGU;ICHIHASHI MIKIO;FUKUHARA SATORU;SHINADA HIROYUKI;KANEKO YUTAKA;SUGIYAMA KATSUYA;TAKATO ATSUKO;TOYAMA HIROSHI |
分类号 |
G01Q30/02;G01N23/00;G01N23/20;G01N23/225;G21K1/08;G21K7/00;H01J37/22;H01J37/244;H01J37/256;H01J37/28;H01L21/66;(IPC1-7):G01N23/225 |
主分类号 |
G01Q30/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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