发明名称 METHOD AND EQUIPMENT FOR INSPECTION USING ELECTRON BEAM
摘要 <p>PROBLEM TO BE SOLVED: To provide high speed method and equipment for inspection using electron beam. SOLUTION: An electron beam 36 from an electron gun 1 is focused through an objective lens 9 and decelerated by a retarding voltage being applied to a sample 13 which is scanned with an electron beam while moving. Secondary electrons 33 emitted from the sample 13 are accelerated by the retarding voltage to produce a substantially parallel beam which is then deflected by an E×B deflector 18 interposed between the objective lens 9 and the sample 13. A secondary electron generating body 19 is irradiated with the deflected beam to emit secondary electrons 20 which are detected by a charged particle detector 21. The detection signal is stored in the form of an image signal and process at an operating section 29 before a decision is made whether a defect is present at a decision section 30 through comparison.</p>
申请公布号 JPH1151886(A) 申请公布日期 1999.02.26
申请号 JP19970212908 申请日期 1997.08.07
申请人 HITACHI LTD 发明人 IWABUCHI HIROKO;TODOKORO HIDEO;MORI HIROYOSHI;SATO MITSUGI;USAMI YASUTSUGU;ICHIHASHI MIKIO;FUKUHARA SATORU;SHINADA HIROYUKI;KANEKO YUTAKA;SUGIYAMA KATSUYA;TAKATO ATSUKO;TOYAMA HIROSHI
分类号 G01Q30/02;G01N23/00;G01N23/20;G01N23/225;G21K1/08;G21K7/00;H01J37/22;H01J37/244;H01J37/256;H01J37/28;H01L21/66;(IPC1-7):G01N23/225 主分类号 G01Q30/02
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