| 摘要 |
PROBLEM TO BE SOLVED: To obtain the positive photoresist composition high in resolution and sensitivity and wide in exposure latitude by using a specified compound as a photosensitive agent and a sensitivity enhancer. SOLUTION: The positive photoresist composition contains an alkali-soluble resin and as the photosensitive agent, the quinonediazide ester represented by formula II and/or as the sensitivity enhancer the polyphenol compound represented by formula I obtained by reaction bis(2,5-dimethyl-3-methylol-4- hydroxyphenyl)methane with 4-ethylphenol. The quinonediazide ester represented by formula II is obtained by esterifying the polyphenol compound of formula I with the naphthoquinone-1,2-diazidosulfonylhalide. In formula I, each of R<1> -R<4> is an H atom or a naphthoquinone-1,2-diazidosulfonyl group. |
