发明名称 Installation for coating plate shaped substrates with thin layers by cathode sputtering
摘要 The suction spaces (19, 19',...; 20, 20',...) respectively at the end of each compartment (C, C',...) and at the beginning of its adjoining compartment (C, C',...) always have an opening (7, 7a,...) for connection to the suction branch (18, 18a,...) of a vacuum pump (8, 8',...; 8a, 8a',...). The adjacent openings (7, 7a,...) are offset relative to one another in a direction perpendicular to the longitudinal direction (A) of the installation.
申请公布号 DE19736318(A1) 申请公布日期 1999.02.25
申请号 DE19971036318 申请日期 1997.08.21
申请人 LEYBOLD SYSTEMS GMBH, 63450 HANAU, DE 发明人 GROSSE, KARL-HEINZ, 63584 GRUENDAU, DE;SCHILLING, HELMUT, 63517 RODENBACH, DE;SAUER, ANDREAS, 63768 HOESBACH, DE
分类号 C23C14/34;C23C14/56;H01L21/00;H01L21/677;(IPC1-7):C23C14/34;H01J37/34 主分类号 C23C14/34
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