发明名称 Cleaning solution
摘要 <p>The present invention relates to a cleaning solution for cleaning substrates, to which a metallic wiring has been applied, being capable of easily removing the metallic impurities of the substrate surface without corroding the metal, not putting a strain on the environment, and not causing a shelf life problem. The cleaning solution comprising at least one member selected from a group consisting of oxalic acid, ammonium oxalate and polyaminocarboxylic acids, but contains no hydrogen fluoride.</p>
申请公布号 EP0897975(A1) 申请公布日期 1999.02.24
申请号 EP19980115097 申请日期 1998.08.11
申请人 KANTO KAGAKU KABUSHIKI KAISHA;NEC CORPORATION 发明人 ISHIKAWA, NORIO;MORI, KIYOTO;AOKI, HIDEMITSU
分类号 C11D7/26;C11D7/32;C11D11/00;H01L21/02;H01L21/306;H05K3/26;(IPC1-7):C11D7/26 主分类号 C11D7/26
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