发明名称 ABRASIVE CLOTH SURFACE ADJUSTING MECHANISM, ABRASIVE CLOTH SURFACE ADJUSTING METHOD, AND POLISHING DEVICE
摘要 PROBLEM TO BE SOLVED: To prevent deterioration of in-plane uniformity in polishing caused by conditioning, and shorten a conditioning time. SOLUTION: A conditioner speed in the radial direction on of a polishing table 1 is changed to keep constant a relative speed of the table 1 to a conditioner 5 irrespective of their positions by rotating the polishing table 1, rotating the cylindrical or truncated cone-shaped conditioner 5 while pressing it to an abrasive cloth 2, and changing a rotational speed of the conditioner in response to a radial directional speed difference of the table in accompaniment of rotation of the table 1, a diametric difference of the conditioner 5 or a position of the conditioner 5. Since the relative speed is determined by a conditioner speed irrespective of a rotational frequency of the table, conditioning equivalent to conventional one is attained in a short time by increasing the relative speed.
申请公布号 JPH1148124(A) 申请公布日期 1999.02.23
申请号 JP19970220890 申请日期 1997.08.01
申请人 NEC CORP 发明人 ISOBE AKIRA
分类号 B24B53/017;H01L21/304 主分类号 B24B53/017
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