发明名称 Wafer with elevated contact structures
摘要 Disclosed is a semiconductor wafer, and the method of making the same, the wafer being formed to have a multiplicity of raised contact pads on its surface. The contact pads are formed with conductors which are disposed on the surface of the wafer and which are coupled to internal circuitry embedded in the wafer through vias in the wafer's surface. The contact pads are in a raised elevational relationship relative to the surface conductors. After the wafer is fully processed, by dicing individual integrated circuit chips out of the wafer, each chip can then be mounted on a higher level of assembly, such as a printed circuit board. The raised contact pads originally formed on the wafer, and therefore formed on each individual chip, provide the contact points by which the chip can be bonded with matingly arranged contact pads on the higher level of assembly.
申请公布号 US5874782(A) 申请公布日期 1999.02.23
申请号 US19950518740 申请日期 1995.08.24
申请人 INTERNATIONAL BUSINESS MACHINES CORPORATION 发明人 PALAGONIA, ANTHONY MICHAEL
分类号 H01L21/56;H01L23/485;(IPC1-7):H01L23/48;H01L29/00;H01L23/52;H01L29/40 主分类号 H01L21/56
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