| 摘要 |
Compounds of formula I, II or III X is a divalent radical; Y is C1-C6 aklylene, cyclohexylene or a direct bond; Ar1 is an aromatic radical as defined in claim 1, R1 and R2 are each independently the other, inter alia, a radical of formula in which p is zero or 1, or a radical of formula R3 is, inter alia, hydrogen, C1-C12alkyl, C5-C12cycloalkyl or phenyl-C1-C3alkyl; R4 is, inter alia, C1-C12cycloalkyl, phenyl-C1-C3alkyl or phenyl; or an acid addition salt of a compound of formula I, II or III; are useful as photosensitive base catalysts in base crosslinking compositions. |
