TESTING APPARATUS OF WAFER PARTICLE

摘要

A pretreatment system for analyzing impurities contained in a flat sample contains a cylindrical lower case having a stepped portion on which the flat sample is seated. The stepped portion is formed in an circumferential inner surface of the cylindrical lower case. A cylindrical upper case is detachably attached to an upper surface of the lower case, and has a supply passage through which a predetermined amount of pretreatment solution can be supplied to the flat sample. A cover closes off the upper surface of the upper case.