发明名称 |
A CARRIER HEAD WITH LOCAL PRESSURE CONTROL FOR A CHEMICAL MECHANICAL POLISHING APPARATUS |
摘要 |
A carrier head for a chemical mechanical polishing apparatus includes a flexible membrane, the lower surface of which provides a substrate-receiving surface. The carrier head may include a projection which contacts an upper surface of the flexible membrane to apply an increased load to a potentially underpolished region of a substrate. Fluid jets may be used for the same purpose. |
申请公布号 |
WO9907516(A1) |
申请公布日期 |
1999.02.18 |
申请号 |
WO1998US16342 |
申请日期 |
1998.08.05 |
申请人 |
APPLIED MATERIALS, INC. |
发明人 |
ZUNIGA, STEVEN, M.;CHEN, HUNG, CHIH;BIRANG, MANOOCHER;WIJEKOON, KAPILA;KO, SEN-HOU |
分类号 |
B24B37/30;B24B37/32;B24B49/16;H01L21/304 |
主分类号 |
B24B37/30 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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