METHOD AND APPARATUS FOR DRYING SUBSTRATES

摘要

A drying apparatus (20) for removing residual liquid from a substrate surface comprises a vapor chamber (25) having a vapor distributor (30) for introducing vapor into the chamber. The drying apparatus (20) further comprises a fluid system (35) comprising (i) a reservoir (40), (ii) a fluid dispenser (45) for introducing fluid into the reservoir, and (iii) a fluid level adjuster (50) for lowering a fluid surface level in the reservoir (40). A multi-point holder (62) is used for holding the substrate (55) at different holding points (63) on the substrate, while the fluid surface level is lowered relative to the substrate, so that residual liquid flows off the substrate surface without intersection of the lowering fluid surface level with holding points (63) on the substrate. The drying apparatus (20) dries substrates (55) substantially without forming stains or streaks, or causing contamination or liquid residue to remain on the substrate (55).