发明名称 FOURIER FILTERING MECHANISM FOR INSPECTING WAFERS
摘要 <p>The present invention resides in a Fourier filter (403) to detect defects on semiconductor wafers. The present invention relates to a Fourier filter to detect defects (900) on semiconductor wafers which is less susceptible to having the filter output affected by vibrations and which avoids the physical contact from conventional damping (706).</p>
申请公布号 WO1999008224(A1) 申请公布日期 1999.02.18
申请号 US1998016301 申请日期 1998.08.05
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