发明名称 RESIN COMPOSITION WITH IMPROVED RADIATION CURABILITY
摘要 <p>The invention relates to a radiation-curable resin composition containing at least a radiation-curable resin, a photo-excitable compound and an aliphatic amine, as amine a compound being chosen that has at least one tertiary amino group, at least one substituent of the tertiary amino group being an aliphatic chain that contains at least one electron-withdrawing group. Such a resin composition can be cured at a conversion that is superior to the conversion achieved according to the state of the art. In addition, the resin composition according to the invention can be cured at an accelerated curing rate, which exceeds or at least equals the curing rate of the resin composition according to the state of the art. Preferably the amine is a branched or star-shaped dendrimer that contains at least one tertiary amino group and in which an electron-withdrawing group is linked via an alkyl chain to the nitrogen atom of the tertiary amino group. Examples of suitable dendrimers are nitrile and ester-terminated polypropylene imine dendrimers.</p>
申请公布号 WO1999007746(A1) 申请公布日期 1999.02.18
申请号 NL1998000439 申请日期 1998.07.30
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