METHOD FOR MAKING A THIN FILM OF SOLID MATERIAL

摘要

The invention concerns a method for making a thin film of solid material, comprising the following steps: a step of ion implantation through a surface of said solid material substrate by means of ions capable of producing, in the substrate volume and at a depth close to the mean penetration of the ions, a layer of microcavities or microbubbles, said step being carried out at a predetermined temperature and for a predetermined duration; an annealing step for bringing the layer of microcavities or microbubbles to a predetermined temperature and for a predetermined duration to obtain a cleavage on either side of the layer of microcavities or microbubbles. The annealing step is carried out with a predetermined thermal budget, based on the thermal budget of the ion implantation step and optionally on other thermal budgets induced by other steps, to obtain said cleavage of the substrate.