发明名称 SUBSTRATE TREATING DEVICE
摘要 PROBLEM TO BE SOLVED: To reduce the power consumption of a substrate treating device by reducing the size of the device. SOLUTION: A hot plate 20 of a heat-treating section 8 is constituted by successively laminating an auxiliary heating and cooling section 31 composed of a Peltier element, an intermediate plate 32, a heater section 33, and a heat radiating plate 34 upon a substrate supporting plate 30. A main controller 13 changes the heat-treating temperature of the heat-treating section 8 by controlling the auxiliary heating and cooling section 31 and heater 33 in accordance with a set treating condition.
申请公布号 JPH1140473(A) 申请公布日期 1999.02.12
申请号 JP19970192453 申请日期 1997.07.17
申请人 DAINIPPON SCREEN MFG CO LTD 发明人 TSUJI MASAO;OTANI MASAMI;IMANISHI YASUO;IWAMI MASAKI;NISHIMURA JOICHI;MORITA AKIHIKO
分类号 H01L21/677;H01L21/02;H01L21/027;H01L21/68;(IPC1-7):H01L21/027 主分类号 H01L21/677
代理机构 代理人
主权项
地址