| 摘要 |
PROBLEM TO BE SOLVED: To prevent multi-exposure, etc., caused by leaked light from occurring when the exposure is interrupted. SOLUTION: When a wafer W is left alone at an exposure position as it is stopped for a long time due to trouble, the wafer W is exposed by peripheral leaked light even when the first shutter 13 of an illumination system 10 is closed. Then, the time of which the wafer W exists at an exposure position is measured. When the existing time exceeds a prescribed time, the wafer W is retreated from the exposure position by driving aθZ tilting stage 24 and an XY stage 25. The quantity of exposure light is reduced by controlling a second shutter 14, a (α) diaphragm 15, an NA diaphragm 23 and the like.
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