| 摘要 |
<p>PROBLEM TO BE SOLVED: To form a charge-up preventing conductive film which hardly produce particles without affecting the pattern dimension of an aperture when the conductive film is formed on the surface of the aperture. SOLUTION: An annular target 1 composed of 80 wt.% Pt and 20 wt.% Pd and having an erosion diameter of 2S is used for an aperture 20 mounted on the holder 2 of a planar type magnetron sputtering device and having an effective pattern dimension of 2L. Therefore, the aperture can be obtained when a conductive film is formed under such a condition that meets a relation, h<S/2 (where h represents the distance between the target 1 and aperture).</p> |
