发明名称 |
THIN-FILM SOLAR CELL AND MANUFACTURE THEREFOR |
摘要 |
PROBLEM TO BE SOLVED: To provide a thin-film solar cell which is lessened in manufacturing cost while maintaining high conversion efficiency and capable of saving resources and a manufacturing method thereof. SOLUTION: Irregularities are provided to the surface of a p-type single crystal silicon board 1. H ions are implanted in layers into the irregular surface of the p-type single crystal silicon board 1 as deep as 5 to 10 μm. A lower electrode layer 6 is formed on a substrate 4 via the intermediary of an insulating layer 5. The irregular surface of the p-type single-crystal board 1 is bonded to the surface of the lower electrode layer 6. By a heat treatment, the p-type single-crystal silicon board 1 is cut into a rugged single-crystal silicon layer 1a which is bonded onto the lower electrode layer 6 and a residual p-type single- crystal board 1b along a gap region 3a distributed in a layer. Through the heat treatment, n-type impurities are diffused into the p-type single-crystal silicon layer 1a from the lower electrode layer 6 so as to form an n-type diffusion layer 1c. |
申请公布号 |
JPH1140832(A) |
申请公布日期 |
1999.02.12 |
申请号 |
JP19970192400 |
申请日期 |
1997.07.17 |
申请人 |
ION KOGAKU KENKYUSHO:KK;HITACHI LTD |
发明人 |
KAJIYAMA KENJI;YONEDA TOMOAKI;KETSUSAKO MITSUNORI |
分类号 |
H01L31/04 |
主分类号 |
H01L31/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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